Efficient Contamination Removal for High-Quality Electron Microscopy

Contamination in electron microscopy can originate from various sources, such as accidental specimen or holder contact, oil back-streaming from diffusion-pumped ion milling systems, contamination within the microscope column, and residues from adhesives or solvents used during specimen preparation. Despite careful cleaning, traditional methods often fall short in fully eliminating contaminants.

Plasma cleaning provides a highly effective solution by removing carbonaceous debris from specimens and preventing further contamination during imaging and analysis. Using a low-energy, inductively coupled high-frequency plasma, it cleans surfaces thoroughly without altering their elemental composition or structural integrity. Even heavily contaminated specimens can be cleaned in less than two minutes.

Versatile and Efficient Design

The plasma cleaner is designed to accommodate a wide range of materials and preparation techniques, making specimen holder insertion quick and easy. A single port leads into the plasma chamber, featuring a vacuum-sealing surface compatible with the specimen holder’s O-ring, and the port can be swapped in just 10 seconds for maximum efficiency.