Fischione 1040 NanoMill

NanoMill®: The Ultimate Solution for TEM Specimens

The NanoMill® system revolutionizes specimen preparation with its ultra-low energy, inert gas, concentrated ion beam, ensuring surfaces free from amorphous damage and implanted layers. Designed to deliver the highest quality results, it is the perfect tool for final-stage polishing of FIB-milled specimens, enhancing transmission electron microscopy (TEM) imaging and analysis with unmatched precision

Features

NanoMill®: Redefining TEM Specimen Perfection

As nanotechnology and semiconductor devices push the limits of miniaturization, transmission electron microscopy (TEM) remains the gold standard for analyzing microstructure and properties. With ever-shrinking features and the rise of aberration-corrected TEMs achieving sub-Ångström resolution, specimen quality is more critical than ever—requiring ultra-thin samples free from preparation-induced artifacts.

The NanoMill® system meets these demands with an ultra-low energy, concentrated ion beam, delivering the highest-quality TEM specimens with minimal damage and maximum precision.

  • Ultra-low-energy, inert-gas ion source for artifact-free thinning
  • Concentrated ion beam with scanning capabilities for precise control
  • Effectively removes damaged layers without redeposition
  • Optimized for post-focused ion beam (FIB) processing
  • Enhances conventionally prepared TEM specimens for superior imaging
  • Room temperature to cryogenically cooled NanoMillingSM process for heat-sensitive materials
  • Rapid specimen exchange for high-throughput applications
  • Computer-controlled, fully programmable operation for ease of use
  • Contamination-free, dry vacuum system for pristine sample preparation

For researchers pushing the boundaries of TEM imaging, the NanoMill® system ensures your specimens meet the highest standards of precision, clarity, and reliability.

Specifications

Ion source

Filament-based ion source combined with electrostatic lens system

Variable voltage (50 eV to 2 kV), continuously adjustable

Beam current density up to 1 mA/cm2

Beam diameter as small as 1 µm at 2,000 eV

Faraday cup for ion beam current monitoring with a range of 1 to 2,000 pA

Field-replaceable apertures

Specimen position control

Load lock allows specimen exchange in less than 10 seconds

Transfer rod for specimen exchange

Milling angle range of −10 to +30°

Stage can be rotated both clockwise and counter-clockwise; the maximum angle is 180°

Stage rotation enables horizontal alignment of the specimen, which enables improved placement of the milling box

Gas

Automated using mass flow control technology

Flow rate up to 2 sccm

Integral particulate filter

Inert gas (argon) with recommended purity of 99.999%

Specimen cooling

Liquid nitrogen conductive cooling with automatic temperature interlocks

Stage temperature to –170 °C

System cool-down time less than 20 minutes

Specimen cool-down time less than 5 minutes

Dewar hold time up to 6 hours

Imaging

SED-based imaging technology

1.8 mm field of view

Everhart-Thornley detector

Specimen image displayed on graphical user interface

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