Plasma Cleaning: The Ultimate Solution for Contamination-Free Electron Microscopy

Contamination in electron microscopy can originate from multiple sources, including accidental specimen contact, oil back-streaming from diffusion-pumped ion milling systems, column contamination, and residues from adhesives or solvents used during preparation. Even with meticulous cleaning, traditional methods often fall short of completely eliminating contaminants.

Plasma cleaning offers a highly effective solution by removing carbonaceous debris and preventing further contamination during imaging and analysis. Utilizing a low-energy, inductively coupled high-frequency plasma, it cleans specimen surfaces without altering their elemental composition or structural integrity. Even heavily contaminated samples can be restored in under two minutes.

Designed for Versatility and Efficiency

• Accommodates a wide range of materials and preparation techniques
• Single-port specimen insertion into the plasma chamber for seamless operation
• Vacuum-sealing surface with O-ring compatibility ensures a secure fit
• Quick-change ports allow easy swapping in just 10 seconds

For high-carbon-content specimens or those mounted on carbon support grids, shielded specimen holder ports optimize the cleaning process.

Seamless Integration Across Systems

The Plasma Cleaner is fully compatible with side-entry specimen holders for all commercial TEMs and STEMs and can also accommodate bulk specimens for pre-cleaning before SEM or surface analysis. Each unit comes complete with:
✔ Customizable specimen holder port
✔ Pumping port assembly
✔ Blank plug assembly