This state-of-the-art ion milling and polishing system delivers unmatched precision and efficiency. Designed to be compact yet powerful, it consistently produces high-quality SEM samples in record time, making it the perfect solution for a wide range of applications. Whether you’re working with delicate materials or demanding sample requirements, this system ensures exceptional results with minimal effort.
Ion milling is a powerful technique in the physical sciences, refining sample surfaces for enhanced imaging and analysis. By ionizing an inert gas—typically argon—and accelerating it toward the sample, material is precisely sputtered away through controlled momentum transfer.
For advanced materials, SEM is the go-to technique for rapid structural and property analysis. The SEM Mill is engineered to deliver the pristine surface characteristics essential for high-resolution SEM imaging, ensuring exceptional results every time.
From routine SEM prep to the most challenging material surfaces, the SEM Mill ensures precision, repeatability, and speed—empowering you to push the boundaries of scientific discovery.
Two TrueFocus ion sources
Variable energy (100 eV to 10.0 keV) operation
Beam current density up to 10 mA/cm2
Milling angle range of 0 to +10°
Choice of single or dual ion source operation
Manual or motorized (optional) ion source angle adjustment
Independent ion source energy control
Adjustable spot size
Faraday cups for the direct measurement of beam current from eachion source; allows optimization and adjustment of the ion source parameters for specific applications
Sample size:
• Cross section
Maximum: 10 x 10 x 4.0 mm [0.39 x 0.39 x 0.157 in.]
Minimum: 3 x 3 x 0.7 mm [0.12 x 0.12 x 0.028 in.]
• Planar
32 mm diameter x 25 mm height [1.25 x 1 in.]
Automatic sample thickness sensing to establish the milling plane and maximize throughput
360° sample rotation with variable rotation speed
Sample rocking
Magnetic encoder provides absolute positioning accuracy
Instrument operation controlled via 254 mm [10 in.], ergonomically
adjustable touch screen
Load lock window accommodates the following microscopes:
• 7 to 45X stereo microscope attachment for direct specimen observation
• 525X high-magnification microscope and CMOS (complementary metal oxide semiconductor) camera system for site-specific image acquisition and display
• 1,960X high-magnification microscope and CMOS camera
system for site-specific image acquisition and display
Brochures
Application Notes