Verios 5 XHR SEM
Characterization of nanomaterials with sub-nanometer resolution and high material contrast
The Verios 5 XHR SEM delivers subnanometer resolution across the full 1 keV to 30 keV energy range, providing exceptional materials contrast. With advanced automation and ease of use, this high-level performance is accessible to users of any experience level.
Scanning electron microscopy characterization
The Verios 5 XHR offers high-resolution imaging of nanomaterials, powered by the UC+ monochromated electron source, ensuring sub-nanometer performance across the 1-30 kV range.
For sensitive materials, it provides high contrast with outstanding performance down to 20 eV landing energy, utilizing high-sensitivity in-column and below-the-lens detectors. Signal filtering enables low-dose operation and optimal contrast selection.
The Elstar electron column, featuring SmartAlign and FLASH technologies, significantly reduces the time to nanoscale information, making it easy to achieve high-quality imaging regardless of the user’s experience level.
Consistent measurements are ensured through ConstantPower lenses, electrostatic scanning, and a choice of two piezoelectric stages.
The Verios 5 XHR SEM also offers flexibility for additional accessories with its large chamber.
For unattended operation, the optional Thermo Scientific AutoScript 4 Software, a Python-based API, allows for automated SEM workflows.
Features
SmartAlign technology
SmartAlign technology eliminates the need for manual alignments of the electron column, reducing maintenance requirements while boosting productivity.
Innovative electron optics
Featuring Thermo Scientific’s patented UC+ gun (monochromator), ConstantPower lenses, and electrostatic scanning, the system ensures precise and stable imaging.
Sub-nanometer resolution
The Elstar Schottky monochromated (UC+) FESEM technology delivers sub-nanometer resolution across the 1 to 30 keV range.
Consistent measurement results
The Verios is ideal for lab-based metrology, offering the capability to calibrate to a NIST-certified standard even at high magnifications.
Low dose operation and optimal contrast selection
An advanced set of high-sensitivity in-column and below-the-lens detectors, along with signal filtering, supports low-dose operation and optimal contrast adjustment.
Easy access to beam landing energies
Achieve very high-resolution surface characterization with beam landing energies as low as 20 eV.
Unattended SEM operation
The system supports automated SEM operation through AutoScript 4 Software, an optional Python-based API.
Large chamber
Equipped with a choice of two precise and stable piezo-driven stages, offering flexibility for various applications.
Specifications
• 0.6 nm at 30 kV STEM (optional)
• 0.6 nm at 2-15 kV
• 0.7 nm at 1 kV
• 1.0 nm at 500 V
• ETD, TLD, MD, ICD, beam current measurement, Nav-Cam+, IR-camera (STANDARD)
• EDS, EBSD, RGB cathodoluminescence, Raman, WDS, and more (OPTIONAL)
• Integrated plasma cleaner
• 379 mm inside width, 21 ports
• Thermo Scientific Maps Software for automatic large area acquisition using tiling and stitching; correlative work
• Thermo Scientific AutoScript 4 Software; a Python-based application programming interface
• Pattern generation software
• TopoMaps for image colorization, image analysis and 3D surface reconstruction